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Chip Talk > Innovative Catalytic Technology Revolutionizes Water Recycling in Semiconductor Manufacturing

Innovative Catalytic Technology Revolutionizes Water Recycling in Semiconductor Manufacturing

Published May 02, 2025


The semiconductor manufacturing industry plays a pivotal role in powering the world's technology, ranging from smartphones to state-of-the-art AI systems. However, one of the often-overlooked aspects of this industry is the immense amount of water required for production. A staggering figure reveals that Taiwan Semiconductor Manufacturing Company (TSMC) uses three billion metric tons of water per day in its facilities, which is thrice the daily water supply of a city like Sydney.

Streamlining the manufacturing process to incorporate efficient water recycling has become imperative. Pollution and resource depletion are growing concerns as the industry continues to expand. With over 100 specialty chemicals involved in the process, understanding which pollutants pose the greatest risk is foundational to developing new recycling methods.

For more on the topic, check out the original article on Tech Xplore.

Challenges of Wastewater Treatment

Traditionally, wastewater from semiconductor production has been filtered and treated to meet environmental guidelines. Two chemicals, in particular, hydrogen peroxide and triazole, present substantial challenges because of their toxicity and resilience. Without effective removal, these pollutants pose significant risks to both human health and the environment.

Given that approximately 10% of a fabrication plant's capital expenditure is allocated for water recycling processes, finding a sustainable solution that is both efficient and cost-effective is crucial.

Enter Catalytic Technology

The partnership between Professor Long Nghiem from the UTS Center for Technology in Water and Wastewater and Infinite Water International (IWI) Australia has led to an innovative breakthrough. By developing a new catalytic process, this technology does not merely filter contaminants but actively breaks them down.

"Rather than altering the traditional processes that have sustained us for decades, our goal is to complement existing infrastructure," notes Professor Long Nghiem. Utilizing a targeted oxidation agent to degrade pollutants into less harmful components, the technique offers a promising solution.

This approach, designed as a plug-and-play unit, seamlessly integrates with existing wastewater systems. The transformation of contaminants is swift—hydrogen peroxide can be effectively removed in minutes, and triazole concentrations can be reduced up to 90% within an hour.

Commercial and Environmental Impact

Two major logic chip manufacturers are currently testing this catalytic technology within their operations. The potential impact of this development extends far beyond immediate operational efficiency. The ability to sustainably recycle water at reduced costs means substantial savings for these corporations and minimal environmental harm.

Matthew Ng, CEO of IWI Australia, underscores, "This technology addresses significant pain points for semiconductor companies. It transforms water treatment from a mere operational necessity into a sustainable advantage."

Patent protections have been established for this technology's application to hydrogen peroxide, with additional patents pending for triazole destruction.

A Step Towards a Sustainable Future

This technological innovation not only addresses pressing environmental concerns but also aligns with larger industry trends towards sustainability. It sets a precedent for other sectors reliant on chemical processes and water resources.

With a keen eye on refining treatment processes, industries can look forward to cleaner production lines and a reduced ecological footprint. As the semiconductor industry grows, innovations like this catalytic technology mark progress towards a more sustainable future.

For those interested in the ongoing developments in semiconductor waste treatment, be sure to follow updates from Tech Xplore.

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